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Physics of technological processes for Micro & Nano systems and Micro & Nano systems

01NYCPE

A.A. 2018/19

Course Language

Italian

Course degree

Course structure
Teaching Hours
Lezioni 60
Teachers
Teacher Status SSD h.Les h.Ex h.Lab h.Tut Years teaching
Graziano Mariagrazia
Micro & Nano systems
Ricercatore ING-INF/01 27 0 0 0 4
Scaltrito Luciano
Physics of technological processes for microsystems
Ricercatore FIS/03 30 0 0 0 8
Teaching assistant
Espandi

Context
SSD CFU Activities Area context
2018/19
Aim of the course (2nd semester, 1st year of the National LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for the fabrication of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro and nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and materials for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices and systems
Aim of the course (2nd semester, 1st year of the National LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for the fabrication of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro and nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and materials for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices and systems
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, modeling, simulation and implementation of microelectronic circuits and microsystems also applied to new technological principles or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and micro and nano systems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructures fabrication. • Knowledge of materials and technologies for Microsystems and MEMS manufacturing. • Ability to apply materials and technologies for the fabrication of microstructures and microsystems. • Knowledge of models and methodologies used for the description and the design of micro and nano systems. • Knowledge of methods and CAD for microsystems design. • Ability to design component for microsystems and MEMS • Knowledge of methods for the integration of MEMS/NEMS with electronic circuits • Knowledge of techniques and issues related to the design, fabrication and verification of nanosystems. • Ability to design integration of MEMS/NEMS and its co-design with electronic circuits
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, modeling, simulation and implementation of microelectronic circuits and microsystems also applied to new technological principles or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and micro and nano systems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructures fabrication. • Knowledge of materials and technologies for Microsystems and MEMS manufacturing. • Ability to apply materials and technologies for the fabrication of microstructures and microsystems. • Knowledge of models and methodologies used for the description and the design of micro and nano systems. • Knowledge of methods and CAD for microsystems design. • Ability to design component for microsystems and MEMS • Knowledge of methods for the integration of MEMS/NEMS with electronic circuits • Knowledge of techniques and issues related to the design, fabrication and verification of nanosystems. • Ability to design integration of MEMS/NEMS and its co-design with electronic circuits
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (1,5 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS) Examples of Microsystems (micro pressure sensors, microaccelerometers, …) (0,5 ECTS) Basics of microsystems simulation; physical multidomain simulation (0,5 ECTS) Elements of 'behavioural' and FEM simulation, examples and use of commercial software CAD tools and their characteristics (1 ECTS) Module concept in micro and nano system technology (1 ECTS) Methods for modeling nanodevices and nanocircuits for the hyerarchical design of micro and nano systems (1,5 ECTS) Simulation, methods for integration and test of micro and nano systems (2 ECTS)
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (1,5 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS) Examples of Microsystems (micro pressure sensors, microaccelerometers, …) (0,5 ECTS) Basics of microsystems simulation; physical multidomain simulation (0,5 ECTS) Elements of 'behavioural' and FEM simulation, examples and use of commercial software CAD tools and their characteristics (1 ECTS) Module concept in micro and nano system technology (1 ECTS) Methods for modeling nanodevices and nanocircuits for the hyerarchical design of micro and nano systems (1,5 ECTS) Simulation, methods for integration and test of micro and nano systems (2 ECTS)
The first part of the course ("Physics of Technological Processes for Micro & Nanosystems") consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course. The second part of the course (“Micro and Nano systems”) consists both in lectures delivered by slides and using blackboards, and of laboratories aimed at simulating, evaluating and designing single devices and micro and nano systems. The slides and laboratory material will be made available to students on the Internet Didactic Portal, and the CAD system for the laboratory exercise will be available and usable during the whole semester.
The first part of the course ("Physics of Technological Processes for Micro & Nanosystems") consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course. The second part of the course (“Micro and Nano systems”) consists both in lectures delivered by slides and using blackboards, and of laboratories aimed at simulating, evaluating and designing single devices and micro and nano systems. The slides and laboratory material will be made available to students on the Internet Didactic Portal, and the CAD system for the laboratory exercise will be available and usable during the whole semester.
Concerning the first part of the course ("Physics of Technological Processes for Micro & Nanosystems ") the didactic material (slides for the lectures) will distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed. For the second part of the course (“Micro and Nano systems”) the material (slides, scientific papers, material for the lab execution) will be available, and some books will be suggested as integration by the teacher.
Concerning the first part of the course ("Physics of Technological Processes for Micro & Nanosystems ") the didactic material (slides for the lectures) will distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed. For the second part of the course (“Micro and Nano systems”) the material (slides, scientific papers, material for the lab execution) will be available, and some books will be suggested as integration by the teacher.
Modalità di esame: prova scritta; prova orale obbligatoria; progetto individuale;
The exam is divided in two parts (each of them worth 6 ECTS), mirroring the division in 2 parts of the course: - The first part (“Physics of Technological Processes for Micro & Nanosystems”, 6 ECTS) involves a written and oral proof. The written exam includes both multiple-answer questions and open questions and short exercises. The total allotted time is 30 mins. No books or notes are allowed. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The oral exam lasts 15-20 minutes and it will cover all the subjects explained during the lectures. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The mark for the first part of the course will be calculated as the average between the written and oral proofs. - The second part (“Micro and nano systems”, 6 ECTS) requires a written proof and a project. The written part is organized in three open questions related to all the subjects discussed during the lectures and the laboratories. The time for this part is 1.5 hours. The aim of the question is to verify the student capability to understand and discuss the major subjects presented, independently on the specific aspects analyzed in the project development. The evaluation criteria focus on the verification of the correctness and the in depth analysis of the suggested subjects, in the student capability to organically present it with a good degree of completeness and of details. The project (to be selected among a list of proposed subjects) consists in analyzing, designing and validating a micro and nano system among those proposed during the lectures or even other more innovative cases. The goal is to give the student the possibility to experiment and to enlarge the knowledge and techniques studied during the lectures and the laboratories. The project evaluation requires verifying the appropriateness of the method used, the correctness of the analysis and design criteria, the completeness and correctness of the results, of the final report and of its related presentation. The final mark (for 12 ECTS) will be the average between the two marks of the two above described exams
Exam: written test; compulsory oral exam; individual project;
The exam is divided in two parts (each of them worth 6 ECTS), mirroring the division in 2 parts of the course: - The first part (“Physics of Technological Processes for Micro & Nanosystems”, 6 ECTS) involves a written and oral proof. The written exam includes both multiple-answer questions and open questions and short exercises. The total allotted time is 30 mins. No books or notes are allowed. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The oral exam lasts 15-20 minutes and it will cover all the subjects explained during the lectures. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The mark for the first part of the course will be calculated as the average between the written and oral proofs. - The second part (“Micro and nano systems”, 6 ECTS) requires a written proof and a project. The written part is organized in three open questions related to all the subjects discussed during the lectures and the laboratories. The time for this part is 1.5 hours. The aim of the question is to verify the student capability to understand and discuss the major subjects presented, independently on the specific aspects analyzed in the project development. The evaluation criteria focus on the verification of the correctness and the in depth analysis of the suggested subjects, in the student capability to organically present it with a good degree of completeness and of details. The project (to be selected among a list of proposed subjects) consists in analyzing, designing and validating a micro and nano system among those proposed during the lectures or even other more innovative cases. The goal is to give the student the possibility to experiment and to enlarge the knowledge and techniques studied during the lectures and the laboratories. The project evaluation requires verifying the appropriateness of the method used, the correctness of the analysis and design criteria, the completeness and correctness of the results, of the final report and of its related presentation. The final mark (for 12 ECTS) will be the average between the two marks of the two above described exams


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