The course is taught in English.
Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area.
The course aims to give to the students’ skills and knowledge of principal design CAD tools and simulation of micro and nanosystems. Starting from basic concepts of microsystems, and their multi-physics modelling, the course develops both modelling and simulation at behavioural level of systems and sub-systems (BEM, behavioural modelling), and the finite element description of structural and functional parts (FEM, finite element modelling) of a microsystem.
This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale.
In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
The course is taught in English.
Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area.
The course aims to give to the students’ skills and knowledge of principal design CAD tools and simulation of micro and nanosystems. Starting from basic concepts of microsystems, and their multi-physics modelling, the course develops both modelling and simulation at behavioural level of systems and sub-systems (BEM, behavioural modelling), and the finite element description of structural and functional parts (FEM, finite element modelling) of a microsystem.
This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale.
In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Expected knowledge:
• development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems;
• development of knowledge over different physical domains, other then electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for realizing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts;
• ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...);
• ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options;
• ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists;
• development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course.
Expected skills
• Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies.
• Knowledge of the basic technologies for microstructure realization.
• Knowledge of materials and technologies for Microsystems and MEMS realization.
• Ability to apply materials and technologies for realization of microstructure and microsystems.
• Knowledge of methods and CAD for microsystem design.
• Ability to design component for microsystem and MEMS
• Knowledge of methods for the integration of MEMS/NEMS with electronic circuits
• Ability to design integration of MEMS/NEMS and its co-design with electronic circuits
Expected knowledge:
• development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems;
• development of knowledge over different physical domains, other then electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for realizing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts;
• ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...);
• ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options;
• ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists;
• development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course.
Expected skills
• Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies.
• Knowledge of the basic technologies for microstructure realization.
• Knowledge of materials and technologies for Microsystems and MEMS realization.
• Ability to apply materials and technologies for realization of microstructure and microsystems.
• Knowledge of methods and CAD for microsystem design.
• Ability to design component for microsystem and MEMS
• Knowledge of methods for the integration of MEMS/NEMS with electronic circuits
• Ability to design integration of MEMS/NEMS and its co-design with electronic circuits
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter)
• Elements of modern physics
• Elements of electronics
• Elements of electronic devices
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter)
• Elements of modern physics
• Elements of electronics
• Elements of electronic devices
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS)
Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS)
Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Introduction to the modeling and the use of CAD for microsystems (1 ECTS)
Modeling and interaction between different physical domains (1 ECTS)
FEM Descriptions, introduction to COMSOL (1 ECTS)
Examples of commercial and OpenSource CAD tools (1 ECTS)
Guided Development in the Laboratory of some examples of microsystems (1 ECTS)
Self-Development of a project of a microsystem, with related models and simulations (1 ECTS)
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS)
Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS)
Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Introduction to the modeling and the use of CAD for microsystems (1 ECTS)
Modeling and interaction between different physical domains (1 ECTS)
FEM Descriptions, introduction to COMSOL (1 ECTS)
Examples of commercial and OpenSource CAD tools (1 ECTS)
Guided Development in the Laboratory of some examples of microsystems (1 ECTS)
Self-Development of a project of a microsystem, with related models and simulations (1 ECTS)
The first part of the course ("Physics of Technological Processes") consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
For the second part of the course ("CAD for Microsystems") hands-on laboratories will be realised in groups, using specific CADs for microsystems. Aim of the hands-on will be to learn practical skills to design and multi-physics simulation. Students will have to be organised in working groups (3 persons maximum) and will execute computer simulations, designing simple projects based on the topics covered during the course, reported in a written document for final assessment.
The first part of the course ("Physics of Technological Processes") consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
For the second part of the course ("CAD for Microsystems") hands-on laboratories will be realised in groups, using specific CADs for microsystems. Aim of the hands-on will be to learn practical skills to design and multi-physics simulation. Students will have to be organised in working groups (3 persons maximum) and will execute computer simulations, designing simple projects based on the topics covered during the course, reported in a written document for final assessment.
Concerning the first part of the course ("Physics of Technological Processes") the didactic material (slides for the lectures) will distributed by teachers. Suggested but not mandatory books will be specified by the teacher.
For the second part of the course ("CAD for Microsystems"):
- Material (slides) provided by the Teacher
- eLearning material based on the European project EduNano (http://edunano.eu). Access credentials will be given during the course
- Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers
- Other texts suggested, but not necessary, will be proposed in class by the Teacher
Concerning the first part of the course ("Physics of Technological Processes") the didactic material (slides for the lectures) will distributed by teachers. Suggested but not mandatory books will be specified by the teacher.
For the second part of the course ("CAD for Microsystems"):
- Material (slides) provided by the Teacher
- eLearning material based on the European project EduNano (http://edunano.eu). Access credentials will be given during the course
- Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers
- Other texts suggested, but not necessary, will be proposed in class by the Teacher
Modalità di esame: Progetto di gruppo;
Exam: Group project;
...
The exam is divided in two parts, mirroring the division in 2 parts of the course:
- The first part (“Physics of Technological Processes”) involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
- for the second part (“CAD for Microsystems”) the exam will be based on the presentation by the student of the developed project, from which will have to be demonstrated the student skills in design and in the use of the CADs for microsystems described during the course. Will be taken into special consideration the ability to develop a project with a critical and original approach, inspired by literature and products currently on the market.
Gli studenti e le studentesse con disabilità o con Disturbi Specifici di Apprendimento (DSA), oltre alla segnalazione tramite procedura informatizzata, sono invitati a comunicare anche direttamente al/la docente titolare dell'insegnamento, con un preavviso non inferiore ad una settimana dall'avvio della sessione d'esame, gli strumenti compensativi concordati con l'Unità Special Needs, al fine di permettere al/la docente la declinazione più idonea in riferimento alla specifica tipologia di esame.
Exam: Group project;
The exam is divided in two parts, mirroring the division in 2 parts of the course:
- The first part (“Physics of Technological Processes”) involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
- for the second part (“CAD for Microsystems”) the exam will be based on the presentation by the student of the developed project, from which will have to be demonstrated the student skills in design and in the use of the CADs for microsystems described during the course. Will be taken into special consideration the ability to develop a project with a critical and original approach, inspired by literature and products currently on the market.
In addition to the message sent by the online system, students with disabilities or Specific Learning Disorders (SLD) are invited to directly inform the professor in charge of the course about the special arrangements for the exam that have been agreed with the Special Needs Unit. The professor has to be informed at least one week before the beginning of the examination session in order to provide students with the most suitable arrangements for each specific type of exam.