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Physics of technological processes/Design of microsystems
01UCCPE, 01UCCOQ
A.A. 2024/25
Design of microsystems
This course aims to give to students an introduction to the Design of Microsystems. A particular focus is given to the use of CAD tools, for the simulation of micro and nanosystems, targeting the design of optimised devices. Starting from basic concepts about microsystems and their multi-physical modeling, the course develops both behavioral modeling and the Finite Element description of structural and functional parts (FEM, Finite Element Modeling) of a microsystem. For both modeling approaches the main CAD tools available are described and used (Matlab/Simulink for behavioral, Comsol for FEM modeling), extracting the relevant project parameters, first for analysis and optimisation, then for system synthesis and integration. An overview of examples of the main applications of micro and nanodevices is given, and a project methodology capable of operating on different domains is taught. Teaching is mainly addressed to students interested in the aspects of design and implementation of micro and nano-scale devices.
Physics of technological process
The course is taught in English. Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Physics of technological processes/Design of microsystems (Design of microsystems)
This course aims to give to students an introduction to the Design of Microsystems. A particular focus is given to the use of CAD tools, for the simulation of micro and nanosystems, targeting the design of optimised devices. Starting from basic concepts about microsystems and their multi-physical modeling, the course develops both behavioral modeling and the Finite Element description of structural and functional parts (FEM, Finite Element Modeling) of a microsystem. For both modeling approaches the main CAD tools available are described and used (Matlab/Simulink for behavioral, Comsol for FEM modeling), extracting the relevant project parameters, first for analysis and optimisation, then for system synthesis and integration. An overview of examples of the main applications of micro and nanodevices is given, and a project methodology capable of operating on different domains is taught. Teaching is mainly addressed to students interested in the aspects of design and implementation of micro and nano-scale devices.
Physics of technological processes/Design of microsystems (Physics of technological process)
The course is taught in English. Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Design of microsystems
This course aims to give to students an introduction to the Design of Microsystems. A particular focus is given to the use of CAD tools, for the simulation of micro and nanosystems, targeting the design of optimised devices. Starting from basic concepts about microsystems and their multi-physical modeling, the course develops both behavioral modeling and the Finite Element description of structural and functional parts (FEM, Finite Element Modeling) of a microsystem. For both modeling approaches the main CAD tools available are described and used (Matlab/Simulink for behavioral, Comsol for FEM modeling), extracting the relevant project parameters, first for analysis and optimisation, then for system synthesis and integration. An overview of examples of the main applications of micro and nanodevices is given, and a project methodology capable of operating on different domains is taught. Teaching is mainly addressed to students interested in the aspects of design and implementation of micro and nano-scale devices.
Physics of technological process
The deepening on technologies at the micro and nano-scale is the basis for the design and manufacture of microelectronic devices, microsensors, microfluidics and for the conception of new nanostructured devices. Technological processes therefore represent a fundamental know-how for both the electronic and the nanotechnology engineer. In this framework, the "Physics of technological process" course provides the theoretical foundation to be exploited in the study of materials, technologies and design for the manufacturing of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. To this aim, particular emphasis will be devoted to provide a comprehensive overview of full process flows and to provide the student with the minimal tools to allow him evaluating different materials and different technological processes so as to select the best suited combination for different devices and applications. This course plays a central role in the development of an Engineer expert in micro and nanotechnologies, since it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Master Degree. In the course the fundamentals of technological processes and materials for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Physics of technological processes/Design of microsystems (Design of microsystems)
This course aims to give to students an introduction to the Design of Microsystems. A particular focus is given to the use of CAD tools, for the simulation of micro and nanosystems, targeting the design of optimised devices. Starting from basic concepts about microsystems and their multi-physical modelling, the course develops both behavioural modelling and the Finite Element description of structural and functional parts (FEM, Finite Element Modeling) of a microsystem. For both modelling approaches the main CAD tools available are described and used (Matlab/Simulink for behavioural, Comsol for FEM modelling), extracting the relevant project parameters, first for analysis and optimisation, then for system synthesis and integration. An overview of examples of the main applications of micro and nanodevices is given, and a project methodology capable of operating on different domains is taught. Teaching is mainly addressed to students interested in the aspects of the design and implementation of micro and nano-scale devices.
Physics of technological processes/Design of microsystems (Physics of technological process)
The deepening on technologies at the micro and nano-scale is the basis for the design and manufacture of microelectronic devices, microsensors, microfluidics and for the conception of new nanostructured devices. Technological processes therefore represent a fundamental know-how for both the electronic and the nanotechnology engineer. In this framework, the "Physics of technological process" course provides the theoretical foundation to be exploited in the study of materials, technologies and design for the manufacturing of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. To this aim, particular emphasis will be devoted to provide a comprehensive overview of full process flows and to provide the student with the minimal tools to allow him evaluating different materials and different technological processes so as to select the best suited combination for different devices and applications. This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, since it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Master Degree. In the course the fundamentals of technologies and materials for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Design of microsystems
- Use of CAD tools for MEMS modeling, analysis and optimisation; - MEMS design basics and methodologies; - Professional approach to the design of MEMS-based applications; - Development of knowledge over different physical domains, other then electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for implementing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts; - Ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); - Ability to integrate technical knowledge and to manage the complexity of MEMS design, evaluating its quality and robustness, its implementation and feasibility, choosing the most efficient solutions from the available options; - Ability to communicate in a clear and unambiguous way technical aspects relating to the design of microsystems, both in writing and oral form and to both specialists and non-specialists; - Development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies for microsystems, not necessarily explained and described during the course.
Physics of technological process
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructure realization. • Knowledge of materials and technologies for Microsystems and MEMS realization. • Ability to apply materials and technologies for realization of microstructure and microsystems. • Knowledge of techniques and issues related to the fabrication and verification of nanosystems.
Physics of technological processes/Design of microsystems (Design of microsystems)
- Use of CAD tools for MEMS modeling, analysis and optimisation; - MEMS design basics and methodologies; - Professional approach to the design of MEMS-based applications; - Development of knowledge over different physical domains, other then electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for implementing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts; - Ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); - Ability to integrate technical knowledge and to manage the complexity of MEMS design, evaluating its quality and robustness, its implementation and feasibility, choosing the most efficient solutions from the available options; - Ability to communicate in a clear and unambiguous way technical aspects relating to the design of microsystems, both in writing and oral form and to both specialists and non-specialists; - Development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies for microsystems, not necessarily explained and described during the course.
Physics of technological processes/Design of microsystems (Physics of technological process)
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructure realization. • Knowledge of materials and technologies for Microsystems and MEMS realization. • Ability to apply materials and technologies for realization of microstructure and microsystems. • Knowledge of techniques and issues related to the fabrication and verification of nanosystems.
Design of microsystems
- Use of CAD tools for MEMS modeling, analysis and optimisation; - MEMS design basics and methodologies; - Professional approach to the design of MEMS-based applications; - Development of knowledge over different physical domains, other then electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for implementing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts; - Ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); - Ability to integrate technical knowledge and to manage the complexity of MEMS design, evaluating its quality and robustness, its implementation and feasibility, choosing the most efficient solutions from the available options; - Ability to communicate in a clear and unambiguous way technical aspects relating to the design of microsystems, both in writing and oral form and to both specialists and non-specialists; - Development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies for microsystems, not necessarily explained and described during the course.
Physics of technological process
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to mature and/or apply original ideas and design methods to the development of a new technological process flow for the production of integrated circuits and microsystems; • knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • knowledge of the basic technologies for microstructures fabrication. • knowledge of materials and technologies for Microsystems and MEMS fabrication. • knowledge of techniques and issues related to the fabrication and verification of nanosystems. Expected competences and skills • ability to identify and select the most suited and to apply materials and technologies for the fabrication of microstructures and microsystems. • ability to apply the acquired knowledge in a research and/or industrial framework, applying capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also in the case of new or unfamiliar issues or entered into broader and more interdisciplinary application contexts than the pure engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects related to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course.
Physics of technological processes/Design of microsystems (Design of microsystems)
- Use of CAD tools for MEMS modelling, analysis and optimisation; - MEMS design basics and methodologies; - Professional approach to the design of MEMS-based applications; - Development of knowledge over different physical domains, other than electrical one (as mechanical, thermal, magnetic, optic, fluidic, ...) and in particular the skill of connecting them together for implementing transduction systems (sensors and actuators for example), and then interfacing and integrating the different parts; - Ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); - Ability to integrate technical knowledge and manage the complexity of MEMS design, evaluating its quality and robustness, its implementation and feasibility, and choosing the most efficient solutions from the available options; - Ability to communicate in a clear and unambiguous way technical aspects relating to the design of microsystems, both in writing and oral form and to both specialists and non-specialists; - Development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies for microsystems, not necessarily explained and described during the course.
Physics of technological processes/Design of microsystems (Physics of technological process)
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to mature and/or apply original ideas and design methods to the development of a technological process flow for the production of integrated circuits and microsystems; • knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • knowledge of the basic technologies for microstructure fabrication. • knowledge of materials and technologies for Microsystems and MEMS fabrication. • knowledge of techniques and issues related to the fabrication and verification of nanosystems. Expected competences and skills • ability to identify and select the most suited and to apply materials and technologies for the fabrication of microstructure and microsystems. • ability to apply the acquired knowledge in a research and/or industrial framework, applying capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also in the case of new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects related to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course.
Design of microsystems
- Basic knowledge about differential equations and solution methodologies - Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) - Basic elements of electronics and electronic devices
Physics of technological process
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
Physics of technological processes/Design of microsystems (Design of microsystems)
- Basic knowledge about differential equations and solution methodologies; - Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) ; - Basic elements of electronics and electronic devices.
Physics of technological processes/Design of microsystems (Physics of technological process)
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
Design of microsystems
- Basic knowledge about differential equations and solution methodologies - Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) - Basic elements of electronics and electronic devices
Physics of technological process
• Elementary physics (mechanics, thermodynamics, wave optics, fluidics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices • Elements of chemistry and materials science • Knowledge of the micro and nano-scale characterization techniques (SEM, TEM, AFM, Raman, XRD, XPS, profilometry, ...)
Physics of technological processes/Design of microsystems (Design of microsystems)
- Basic knowledge about differential equations and solution methodologies; - Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) ; - Basic elements of electronics and electronic devices.
Physics of technological processes/Design of microsystems (Physics of technological process)
• Elementary physics (mechanics, thermodynamics, wave optics, fluidics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices • Elements of chemistry and materials science • Knowledge of the micro and nano-scale characterization techniques (SEM, TEM, AFM, Raman, XRD, XPS, profilometry, ...)
Design of microsystems
- Introduction to the modeling and the use of CAD for microsystems (1 ECTS) - Modeling and interaction between different physical domains (1 ECTS) - Finite Element Modeling, introduction to COMSOL (1 ECTS) - Guided Development in laboratory of some examples of microsystems (1 ECTS) - Self-Development and design of a microsystem, with related models and simulations (2 ECTS)
Physics of technological process
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Physics of technological processes/Design of microsystems (Design of microsystems)
- Introduction to the modeling and the use of CAD for microsystems (1 ECTS); - Modeling and interaction between different physical domains (1 ECTS); - Finite Element Modeling, introduction to COMSOL (1 ECTS); - Guided Development in laboratory of some examples of microsystems (1 ECTS); - Self-Development and design of a microsystem, with related models and simulations (2 ECTS).
Physics of technological processes/Design of microsystems (Physics of technological process)
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Design of microsystems
- Introduction to the modeling and the use of CAD for microsystems (1 ECTS) - Modeling and interaction between different physical domains (1 ECTS) - Finite Element Modeling, introduction to COMSOL (1 ECTS) - Guided Development in laboratory of some examples of microsystems (1 ECTS) - Self-Development and design of a microsystem, with related models and simulations (2 ECTS)
Physics of technological process
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS). No distinction to be reported for the content of the course according to the fact that it will be carried out in presence or remotely.
Physics of technological processes/Design of microsystems (Design of microsystems)
- Introduction to the modeling and the use of CAD for microsystems (1 ECTS); - Modeling and interaction between different physical domains (1 ECTS); - Finite Element Modeling, introduction to COMSOL (1 ECTS); - Guided Development in laboratory of some examples of microsystems (1 ECTS); - Self-Development and design of a microsystem, with related models and simulations (2 ECTS).
Physics of technological processes/Design of microsystems (Physics of technological process)
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS). No distinction to be reported for the content of the course according to the fact that it will be carried out in presence or remotely.
Design of microsystems
Physics of technological process
Physics of technological processes/Design of microsystems (Design of microsystems)
Physics of technological processes/Design of microsystems (Physics of technological process)
Design of microsystems
Physics of technological process
Physics of technological processes/Design of microsystems (Design of microsystems)
Physics of technological processes/Design of microsystems (Physics of technological process)
Design of microsystems
The course is structured with an initial part where the basic concepts of MEMS modeling are introduced. Then the needed knowledge for using MEMS CAD tools is given, passing to the second part of the course where laboratory hand-on sessions will be carried out by the students, with the tutorship of the professors present in the lab. Aim of the hands-on is to learn practical skills to design and multi-physics simulation. Students have to design a simple MEMS device, preparing for final assessment a tutorial related to a specific chosen application.
Physics of technological process
The course consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
Physics of technological processes/Design of microsystems (Design of microsystems)
The course is structured with an initial part where the basic concepts of MEMS modeling are introduced. Then the needed knowledge for using MEMS CAD tools is given, passing to the second part of the course where laboratory hand-on sessions will be carried out by the students, with the tutorship of the professors present in the lab. Aim of the hands-on is to learn practical skills to design and multi-physics simulation. Students have to be organised in working groups (3 persons maximum) and design simple MEMS devices, preparing for final assessment a tutorial related to a specific chosen application.
Physics of technological processes/Design of microsystems (Physics of technological process)
The course consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
Design of microsystems
The course is structured with an initial part where the basic concepts of MEMS modeling are introduced. Then the needed knowledge for using MEMS CAD tools is given, passing to the second part of the course where laboratory hand-on sessions will be carried out by the students, with the tutorship of the professors present in the lab. Aim of the hands-on is to learn practical skills to design and multi-physics simulation. Students have to design a simple MEMS device, preparing for final assessment a tutorial related to a specific chosen application.
Physics of technological process
The course consists of lectures covering the topics described in the Course Topics section, delivered by slides and the use of the blackboard (or alternative tools like graphical tablet or similar in case of remote or blended lectures). The slides will be made available to students in pdf format on the Internet Didactic Portal at the beginning of the course. Laboratory practice sessions will also be organized to allow students to become familiar with some basic technologies for devices manufacturing (e.g. lithography)
Physics of technological processes/Design of microsystems (Design of microsystems)
The course is structured with an initial part where the basic concepts of MEMS modelling are introduced. Then the needed knowledge for using MEMS CAD tools is given, passing to the second part of the course where laboratory hand-on sessions will be carried out by the students, with the tutorship of the professors present in the lab. The aim of the hands-on is to learn practical skills to design and multi-physics simulation. Students must be organised in working groups (3 persons maximum) and design simple MEMS devices. The students have the possibility (not mandatory), with the same lab group, to develop a specific model of a simple device, with a related final report that is evaluated for the exam and gives a maximum of 3 points, which are added to the evaluation of the written exam (mandatory).
Physics of technological processes/Design of microsystems (Physics of technological process)
The course consists of lectures covering the topics described in the Course Topics section, delivered by slides and the use of the blackboard (or alternative tools like graphical tablet or similar in case of remote or blended lectures). The slides will be made available to students in pdf format on the Internet Didactic Portal at the beginning of the course.
Design of microsystems
- Material (slides) provided by the Teacher - eLearning material based on two European projects: EduNano (http://edunano.eu). and NanoEl Asia (http://nanoel-asia.eu). Access credentials will be given during the course - Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers
Physics of technological process
The didactic material (slides for the lectures) will be distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Physics of technological processes/Design of microsystems (Design of microsystems)
- Material (slides) provided by the Teacher ; - eLearning material based on two European projects: EduNano (http://edunano.eu). and NanoEl Asia (http://nanoel-asia.eu). Access credentials will be given during the course; - Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers.
Physics of technological processes/Design of microsystems (Physics of technological process)
The didactic material (slides for the lectures) will be distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Design of microsystems
- Material (slides) provided by the Teacher - eLearning material based on the European project NanoEl Asia (http://nanoel-asia.eu). Access credentials will be given during the course - Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers
Physics of technological process
The didactic material (slides for the lectures) will be distributed in pdf format by the teacher and uploaded on the Didactic Portal before the course start. All the lectures will be moreover recorded and related videos made available on the Didactic Portal. Suggested but not mandatory additive readings and books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Physics of technological processes/Design of microsystems (Design of microsystems)
- Material (slides) provided by the Teacher - Stephen D. Senturia, "Microsystem Design", Kluwer Academic Publishers
Physics of technological processes/Design of microsystems (Physics of technological process)
The didactic material (slides for the lectures) will be distributed in pdf format by the teacher and uploaded on the Didactic Portal before the course start. All the lectures will be moreover available as recorded videos form previous academic years on the Didactic Portal. Suggested but not mandatory additive readings and books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Design of microsystems
Modalità di esame: Prova scritta (in aula); Elaborato progettuale in gruppo;
Physics of technological process
Modalità di esame: Prova scritta (in aula);
Physics of technological processes/Design of microsystems (Design of microsystems)
Modalità di esame: Prova scritta (in aula); Elaborato progettuale in gruppo;
Physics of technological processes/Design of microsystems (Physics of technological process)
Modalità di esame: Prova scritta (in aula);
Design of microsystems
Exam: Written test; Group project;
Physics of technological process
Exam: Written test;
Physics of technological processes/Design of microsystems (Design of microsystems)
Exam: Written test; Group project;
Physics of technological processes/Design of microsystems (Physics of technological process)
Exam: Written test;
Design of microsystems
The written exam (compulsory) will give a maximum of 30/30. The Project (compulsory) will give a maximum of 4 points that will be added to the written exam. For obtaining the Laude the student must obtain 30/30 of the written exam and 4 points for the Project.
Physics of technological process
The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
Physics of technological processes/Design of microsystems (Design of microsystems)
The assessment is organized with a mandatory written exam that gives a maximum mark of 30/30. The students (organized in groups of no more than 3 elements) can do a not mandatory project of a simple device, with simulations based on the tools learnt during the course, and produce a final written report. This work is evaluated and can give a maximum of 3 points, which are added to the written exam mark. If the final sum is larger than 30, the "cum laude" is assigned.
Physics of technological processes/Design of microsystems (Physics of technological process)
The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
Design of microsystems
Exam: Written test; Group project;
Physics of technological process
Exam: Written test;
Physics of technological processes/Design of microsystems (Design of microsystems)
Exam: Written test; Group project;
Physics of technological processes/Design of microsystems (Physics of technological process)
Exam: Written test;
Design of microsystems
The written exam (compulsory) will give a maximum of 30/30. The Project (compulsory) will give a maximum of 4 points that will be added to the written exam. For obtaining the Laude the student must obtain 30/30 of the written exam and 4 points for the Project.
Physics of technological process
Expected learning outcomes Understanding of the covered topics and ability to grasp the fundamental aspects of the various technologies and related materials. Ability to compare (advantages/disadvantages) the different technological tools for the manufacture of a device. Ability to compare, identify and logically use the best technological tools in order to optimize the manufacturing process of a device. Ability to build a logical path by assembling the various technological processes, for the construction of a micro and nano-scale device. Criteria, rules and procedures for the examination The exam is aimed at ascertaining the knowledge of the topics listed in the official program of the course and the ability to apply the theoretical contents for the solution of simple exercises for the assembly of technological processes. The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. No books, notes or any other didactic material is allowed. No negative points for the wrong multiple-answer questions, while missing answers will be considered as "0 points" on the cumulative result of the final mark. The assessments are expressed in thirtieths and the exam is passed if the mark is at least 18/30. The maximum achievable mark is 30 cum laude. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The exam results are communicated directly to students at the end of the written exam revision by the teacher.
Physics of technological processes/Design of microsystems (Design of microsystems)
The assessment is organized with a mandatory written exam that gives a maximum mark of 30/30. The students (organized in groups of no more than 3 elements) can do a not mandatory project of a simple device, with simulations based on the tools learnt during the course, and produce a final written report. This work is evaluated and can give a maximum of 3 points, which are added to the written exam mark. If the final sum is larger than 30, the "cum laude" is assigned.
Physics of technological processes/Design of microsystems (Physics of technological process)
Expected learning outcomes Understanding of the covered topics and ability to grasp the fundamental aspects of the various technologies and related materials. Ability to compare (advantages/disadvantages) the different technological tools for the manufacture of a device. Ability to compare, identify and logically use the best technological tools in order to optimize the manufacturing process of a device. Ability to build a logical path by assembling the various technological processes, for the construction of a micro and nano-scale device. Criteria, rules and procedures for the examination The exam is aimed at ascertaining the knowledge of the topics listed in the official program of the course and the ability to apply the theoretical contents for the solution of simple exercises for the assembly of technological processes. The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. No books, notes or any other didactic material is allowed. No negative points for the wrong multiple-answer questions, while missing answers will be considered as "0 points" on the cumulative result of the final mark. The assessments are expressed in thirtieths and the exam is passed if the mark is at least 18/30. The maximum achievable mark is 30 cum laude. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The exam results are communicated directly to students at the end of the written exam revision by the teacher.