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Advanced microsystems and LABS
06NPHPE
A.A. 2024/25
Advanced microsystems and LABS
The course is taught in English. Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Advanced microsystems and LABS (Microsystems II)
The course is taught in English. Aim of the course (1st semester, 1st year of the International LM in Nanotechnologies for ICT) is to provide the theoretical basics to be exploited in the study of materials, technologies and design for realization of microelectronic devices, micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with particular emphasis on applications in the ICT area. This course plays a central role in the development of an Engineer expert in micro an nanotechnologies, because it extensively provides the basic elements for the fabrication and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Laurea Magistrale. In the course the fundamentals of technologies and material for microelectronics and microsystems and some examples of the same are treated and discussed, thus making the course specifically addressed to those students interested in the fabrication and design aspects of micro and nano-scale devices.
Advanced microsystems and LABS
Access to the course is restricted to the students of Master Degree in Nanotechnologies for ICTs, international path (International Master's Degree in Micro and Nano Technologies for Integrated Systems, MNIS) managed by PoliTo, INPG-Grenoble and EPFL-Lausanne. Indeed, the course is held @INPG-Grenoble in February, at the beginning of the second semester for the international master degree students in Nanotechnologies for ICTs. This course is a follow-up of the course "Physics of technological processes" (1st semester), which, as a consequence, is absolutely strongly preparatory. The deepening on technologies and devices at the micro and nano-scale is the basis for the design and manufacture of microelectronic devices, microsensors, microfluidics and for the conception of new multifunctional devices in different technical domains and scientific fields. How exploiting technological processes addressing the implementation of MEMS, microsensors and microactuators is therefore a fundamental know-how for the nanotechnology engineer. In this framework, the "Microsystems II" course provides the theoretical and practical (through examples from the state-of-the-art of the MEMS market) foundation for the study of materials, technologies and design methodologies for the manufacturing of micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with an approach focused on to a wide portfolio of applications. To this aim, particular emphasis will be devoted to provide a comprehensive overview of different readout mechanisms, layout and architectural solutions as a function of the specific application, so as to provide the student with the minimal tools allowing him evaluating the best suited combination for different devices and applications. This course plays a central role in the development of an Engineer expert in micro and nanotechnologies, since it extensively provides the basic elements for the selection and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Master Degree. In the course, different examples of MEMS and microsystems devices are treated and discussed, thus making the course specifically addressed to those students interested in the application of fabrication and design aspects to micro and nano-scale devices.
Advanced microsystems and LABS (Microsystems II)
Access to the course is restricted to the students of Master Degree in Nanotechnologies for ICTs, international path (International Master's Degree in Micro and Nano Technologies for Integrated Systems, MNIS) managed by PoliTo, INPG-Grenoble and EPFL-Lausanne. Indeed, the course is held @INPG-Grenoble in February, at the beginning of the second semester for the international master degree students in Nanotechnologies for ICTs. This course is a follow-up of the course "Physics of technological processes" (1st semester), which, as a consequence, is absolutely strongly preparatory. The deepening on technologies and devices at the micro and nano-scale is the basis for the design and manufacture of microelectronic devices, microsensors, microfluidics and for the conception of new multifunctional devices in different technical domains and scientific fields. How exploiting technological processes addressing the implementation of MEMS, microsensors and microactuators is therefore a fundamental know-how for the nanotechnology engineer. In this framework, the "Microsystems II" course provides the theoretical and practical (through examples from the state-of-the-art of the MEMS market) foundation for the study of materials, technologies and design methodologies for the manufacturing of micro and nanostructures, microsystems and MEMS/NEMS (micro/nano-electro-mechanical systems), with an approach focused on to a wide portfolio of applications. To this aim, particular emphasis will be devoted to provide a comprehensive overview of different readout mechanisms, layout and architectural solutions as a function of the specific application, so as to provide the student with the minimal tools allowing him evaluating the best suited combination for different devices and applications. This course plays a central role in the development of an Engineer expert in micro and nanotechnologies, since it extensively provides the basic elements for the selection and design of the above mentioned devices and it is preparatory for the understanding of subsequent courses of the Master Degree. In the course, different examples of MEMS and microsystems devices are treated and discussed, thus making the course specifically addressed to those students interested in the application of fabrication and design aspects to micro and nano-scale devices.
Advanced microsystems and LABS
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructure realization. • Knowledge of materials and technologies for Microsystems and MEMS realization. • Ability to apply materials and technologies for realization of microstructure and microsystems. • Knowledge of techniques and issues related to the fabrication and verification of nanosystems.
Advanced microsystems and LABS (Microsystems II)
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to develop and/or apply original ideas and design methods and the development of a technological process flow for the production of integrated circuits and microsystems; • ability to apply the knowledge gained in a research and/or industrial framework, understanding capability and skills in solving problems related to the design, simulation and implementation of microelectronic circuits and microsystems also applied to new or unfamiliar issues or entered into application contexts broader and more interdisciplinary than the engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a process flow, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects relating to the design and manufacture of integrated circuits and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new techniques and design methodologies and fabrication techniques for integrated circuits and microsystems, not necessarily explained and described during the course. Expected skills • Knowledge of the physical-chemical behaviour of materials to be used in micro and nanotechnologies. • Knowledge of the basic technologies for microstructure realization. • Knowledge of materials and technologies for Microsystems and MEMS realization. • Ability to apply materials and technologies for realization of microstructure and microsystems. • Knowledge of techniques and issues related to the fabrication and verification of nanosystems.
Advanced microsystems and LABS
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to mature and/or apply original ideas and design methods to the development of new MEMS and microsystems; • knowledge of the physical-chemical behaviour of materials to be used in micro and nano-devices. • knowledge of the basic technologies for MEMS fabrication. • knowledge of materials and technologies for Microsystems and MEMS fabrication. • knowledge of techniques and issues related to the fabrication and verification of MEMS. • knowledge of the different readout mechanisms, layouts and architectural solutions related to the fabrication and verification of MEMS. • knowledge of the impact of environmental conditions on the performance of MEMS. Expected competences and skills • ability to identify and select the most suited and to apply readout mechanisms, layouts and architectural solutions for the implementation of MEMS and microsystems. • ability to apply the acquired knowledge in a research and/or industrial framework, for instance for solving problems related to the design, simulation and implementation of MEMS and microsystems, also in the case of new or unfamiliar requirements or entered into broader and more interdisciplinary application contexts than the pure engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate previously acquired technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a MEMS device, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects related to the design and manufacture of MEMS and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new design methodologies and fabrication techniques for MEMS and microsystems, not necessarily explained and described during the course.
Advanced microsystems and LABS (Microsystems II)
Expected knowledge: • development of knowledge that extends and/or reinforces the ones received from preparatory courses and allow to mature and/or apply original ideas and design methods to the development of new MEMS and microsystems; • knowledge of the physical-chemical behaviour of materials to be used in micro and nano-devices. • knowledge of the basic technologies for MEMS fabrication. • knowledge of materials and technologies for Microsystems and MEMS fabrication. • knowledge of techniques and issues related to the fabrication and verification of MEMS. • knowledge of the different readout mechanisms, layouts and architectural solutions related to the fabrication and verification of MEMS. • knowledge of the different techniques for the optimization of MEMS and microsensors performance (sensitivity, linearity range, limit of detection, ...) • knowledge of the impact of environmental conditions on the performance of MEMS. Expected competences and skills • ability to identify and select the most suited and to apply readout mechanisms, layouts and architectural solutions for the implementation of MEMS and microsystems. • ability to apply the acquired knowledge in a research and/or industrial framework, for instance for solving problems related to the design, simulation and implementation of MEMS and microsystems, also in the case of new or unfamiliar requirements or entered into broader and more interdisciplinary application contexts than the pure engineering sector (medicine, environmental monitoring, food, ...); • ability to integrate previously acquired technical knowledge and to manage the complexity of the design and manufacturing process flow, to evaluate the quality and robustness of a MEMS device, its implementation and feasibility, choosing the most efficient solutions from the available options; • ability to communicate in a clear and unambiguous way technical aspects related to the design and manufacture of MEMS and microsystems, both in writing and oral form and to both specialists and non-specialists; • development of self-learning skills to allow the student to continue to learn autonomously new design methodologies and fabrication techniques for MEMS and microsystems, not necessarily explained and described during the course.
Advanced microsystems and LABS
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
Advanced microsystems and LABS (Microsystems II)
• Elementary physics (mechanics, thermodynamics, wave optics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices
Advanced microsystems and LABS
Topics covered by the course of "Physics of technological processes" (1st semester) are strongly preparatory • Elementary physics (mechanics, thermodynamics, wave optics, fluidics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices • Elements of chemistry and materials science • Knowledge of the microfabrication technologies (see "Physics of technological processes" Course Program) • Knowledge of the micro and nano-scale characterization techniques (SEM, TEM, AFM, Raman, XRD, XPS, profilometry, ...)
Advanced microsystems and LABS (Microsystems II)
Topics covered by the course of "Physics of technological processes" (1st semester) are strongly preparatory • Elementary physics (mechanics, thermodynamics, wave optics, fluidics, elements of structure of matter) • Elements of modern physics • Elements of electronics • Elements of electronic devices • Elements of chemistry and materials science • Knowledge of the microfabrication technologies (see "Physics of technological processes" Course Program) • Knowledge of the micro and nano-scale characterization techniques (SEM, TEM, AFM, Raman, XRD, XPS, profilometry, ...)
Advanced microsystems and LABS
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Advanced microsystems and LABS (Microsystems II)
Integrated Circuits technologies (wafer preparation, cleanroom technology, silicon oxidation, epitaxy, CVD, evaporation, sputtering, electroplating, diffusion, ion implantation) (2 ECTS) Lithographic techniques, wet etching, dry etching, back-end technologies, CMOS process flow (2 ECTS) Introduction to MEMS and NEMS, bulk micromachining, surface micromachining, LIGA, wafer bonding, MEMS packaging, MEMS complementary technologies (2 ECTS)
Advanced microsystems and LABS
Micro pressure sensors (2,5 hrs) Micro accelerometers (2 hrs) Acoustic sensors (3 hrs) Flow sensors (1 hr) Microfluidic devices (4 hrs) Chemical sensors (1,5 hrs) Biosensors (1,5 hrs) MEMS for biomedical applications (2 hrs) MEMS for genomic applications (2,5 hrs) No distinction to be reported for the content of the course according to the fact that it will be carried out in presence or remotely.
Advanced microsystems and LABS (Microsystems II)
Micro pressure sensors (2,5 hrs) Micro accelerometers (2 hrs) Acoustic sensors (3 hrs) Flow sensors (1 hr) Microfluidic devices (4 hrs) Chemical sensors (1,5 hrs) Biosensors (1,5 hrs) MEMS for biomedical applications (2 hrs) MEMS for genomic applications (2,5 hrs) No distinction to be reported for the content of the course according to the fact that it will be carried out in presence or remotely.
Advanced microsystems and LABS
Advanced microsystems and LABS (Microsystems II)
Advanced microsystems and LABS
Advanced microsystems and LABS (Microsystems II)
Advanced microsystems and LABS
The course consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
Advanced microsystems and LABS (Microsystems II)
The course consists of lectures delivered by slides and the use of the blackboard. The slides will be made available to students on the Internet Didactic Portal at the beginning of the course.
Advanced microsystems and LABS
The course consists of lectures (20 hours) covering the topics described in the Course Topics section, delivered by slides and the use of the blackboard (or alternative tools like graphical tablet or similar in case of remote or blended lectures). The slides will be made available to students in pdf format on the Internet Didactic Portal at the beginning of the course.
Advanced microsystems and LABS (Microsystems II)
The course consists of lectures (20 hours) covering the topics described in the Course Topics section, delivered by slides and the use of the blackboard (or alternative tools like graphical tablet or similar in case of remote or blended lectures). The slides will be made available to students in pdf format on the Internet Didactic Portal at the beginning of the course.
Advanced microsystems and LABS
The didactic material (slides for the lectures) will be distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Advanced microsystems and LABS (Microsystems II)
The didactic material (slides for the lectures) will be distributed by teachers. Suggested but not mandatory books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Advanced microsystems and LABS
The didactic material (slides for the lectures) will be distributed in pdf format by the teacher and uploaded on the Didactic Portal before the course start. Only in case of online lectures, all the lectures will be moreover recorded and related videos made available on the Didactic Portal. Suggested but not mandatory additive readings and books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Advanced microsystems and LABS (Microsystems II)
The didactic material (slides for the lectures) will be distributed in pdf format by the teacher and uploaded on the Didactic Portal before the course start. Only in case of online lectures, all the lectures will be moreover recorded and related videos made available on the Didactic Portal. Suggested but not mandatory additive readings and books will be specified by the teacher. Among them: - “Microsystem Technology”, W. Menz, J. Mohr, O.Paul, Wiley-VCH ed.
Advanced microsystems and LABS
Modalità di esame: Prova scritta (in aula);
Advanced microsystems and LABS (Microsystems II)
Modalità di esame: Prova scritta (in aula);
Advanced microsystems and LABS
Exam: Written test;
Advanced microsystems and LABS (Microsystems II)
Exam: Written test;
Advanced microsystems and LABS
The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
Advanced microsystems and LABS (Microsystems II)
The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare similar technologies, compare results or processing parameters of technological processes or performance of different materials. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language.
Advanced microsystems and LABS
Exam: Written test;
Advanced microsystems and LABS (Microsystems II)
Exam: Written test;
Advanced microsystems and LABS
Expected learning outcomes Understanding of the covered topics and ability to grasp the fundamental aspects of the various MEMS devices and related characteristics and fabrication technologies. Ability to compare (advantages/disadvantages) the different readout mechanisms for the implementation of a specific sensing (or actuating) MEMS device. Ability to compare, identify and logically use the best readout mechanism, architecture, layout solutions and technological tools in order to optimize the performance (sensitivity, linearity range, robustness, ...) of a MEMS device. Ability to build a logical path by assembling the various technological processes, for the construction of a micro and nano-scale device. Criteria, rules and procedures for the examination The exam is aimed at ascertaining the knowledge of the topics listed in the official program of the course and the ability to apply the theoretical contents for the solution of simple problems and requirements for the implementation of MEMS devices. The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. No books, notes or any other didactic material is allowed. No negative points for the wrong multiple-answer questions, while missing answers will be considered as "0 points" on the cumulative result of the final mark. For the evaluation of the exam, french exams rules apply, so the assessments are expressed in twentieths and the exam is passed if the mark is at least 10/20. The maximum achievable mark is 20/20. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare devices, readout mechanisms, archietctural and layout solutions, results or processing parameters of technological processes or performance of different materials for the implementation of MEMS devices and microsensors. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The exam results are communicated directly to students at the end of the written exam revision by the teacher.
Advanced microsystems and LABS (Microsystems II)
Expected learning outcomes Understanding of the covered topics and ability to grasp the fundamental aspects of the various MEMS devices and related characteristics and fabrication technologies. Ability to compare (advantages/disadvantages) the different readout mechanisms for the implementation of a specific sensing (or actuating) MEMS device. Ability to compare, identify and logically use the best readout mechanism, architecture, layout solutions and technological tools in order to optimize the performance (sensitivity, linearity range, robustness, ...) of a MEMS device. Ability to build a logical path by assembling the various technological processes, for the construction of a micro and nano-scale device. Criteria, rules and procedures for the examination The exam is aimed at ascertaining the knowledge of the topics listed in the official program of the course and the ability to apply the theoretical contents for the solution of simple problems and requirements for the implementation of MEMS devices. The exam involves a written proof including both multiple-answer questions and open questions and short exercises. The total allotted time is 60 mins. No books, notes or any other didactic material is allowed. No negative points for the wrong multiple-answer questions, while missing answers will be considered as "0 points" on the cumulative result of the final mark. For the evaluation of the exam, french exams rules apply, so the assessments are expressed in twentieths and the exam is passed if the mark is at least 10/20. The maximum achievable mark is 20/20. The type of proposed questions aims to test the student ability to understand and revision the topics covered in class lectures, with particular reference to the ability to compare devices, readout mechanisms, archietctural and layout solutions, results or processing parameters of technological processes or performance of different materials for the implementation of MEMS devices and microsensors. The main evaluation criteria of the exam consist in the correctness of the tests solutions, the completeness and synthesis of the responses to the open questions and the correctness of the employed technical language. The exam results are communicated directly to students at the end of the written exam revision by the teacher.