Politecnico di Torino
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Politecnico di Torino
Anno Accademico 2009/10
01KEFGH, 01KEFCI
Characterizations of technological processes
Corso di L. Specialistica in Nanotecnologie Per Le Ict (To/Grenoble/Losanna) - Torino/Grenoble/Losanna
Corso di L. Specialistica in Ingegneria Elettronica - Torino
Docente Qualifica Settore Lez Es Lab Tut Anni incarico
Giorgis Fabrizio ORARIO RICEVIMENTO O2 FIS/03 3.2 0 0.8 0 5
SSD CFU Attivita' formative Ambiti disciplinari
FIS/03 4 A - Di base Fisica e chimica
Obiettivi dell'insegnamento
To provide basic knowledge of characterization techniques for the microelectronic industry and the micro and nano-technology research fields
Programma
Courses
Introduction to Materials Characterization: Composition, Stucture and Morphology through fundamental interactions (photons-matter, electrons-matter, ions/particles-matter)
Morphology ' optical microscopy (conventional, confocal and near-field optical microscopies)
Electronic microscopy (SEM and TEM)
Ionic microscopy (Focus Ion Beam)
Scanning probe microscopy (STM and AFM)
Structure ' X-ray scattering and diffraction
Electron diffraction
Neutron diffraction
Particles diffraction
In-situ optical analysis
Photoluminescence and plasma-emission spectroscopy
Raman and Infrared spectroscopy
Composition ' Electron Probe Microanalysis
Auger spectroscopy
X-ray Photoelectron Spectroscopy
Secondary Ion Mass Spectrometry
Rutherford Backscattering Spectrometry and Electron Recoil Detection Analysis
Submicrometric lithography through Scanning Probe methods ' STM, AFM, SNOM
X-ray lithography
Laboratori e/o esercitazioni
Exercises and laboratories
a) Growth of thin films by Plasma Enhanced CVD techniques, etching through plasma processes, analysis trough microscopy and profilometry
b) Analysis of bulk and thin film semiconductors by transmittance, photoluminescence, Raman and Infrared spectroscopy
c) Surface analysis of bulk, thin film and nanostructured semiconductors by Atomic Force and Scanning Electron Microscopies; compositional insight trough Electron Microanalysis
d) Metal growth, Optical lithography and wet-etching for the fabrication of micrometric patterning on Silicon substrates
Orario delle lezioni
Statistiche superamento esami

Programma definitivo per l'A.A.2009/10
Indietro



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