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Politecnico di Torino | |||||||||||||||||
Academic Year 2009/10 | |||||||||||||||||
01KEFGH, 01KEFCI Characterizations of technological processes |
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Master of science-level of the Bologna process in Nanotechnologies For Ict Engineering - Torino/Grenoble/Losanna Master of science-level of the Bologna process in Electronic Engineering - Torino |
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Objectives of the course
To provide basic knowledge of characterization techniques for the microelectronic industry and the micro and nano-technology research fields
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Syllabus
Courses
Introduction to Materials Characterization: Composition, Stucture and Morphology through fundamental interactions (photons-matter, electrons-matter, ions/particles-matter) Morphology '³ optical microscopy (conventional, confocal and near-field optical microscopies) Electronic microscopy (SEM and TEM) Ionic microscopy (Focus Ion Beam) Scanning probe microscopy (STM and AFM) Structure '³ X-ray scattering and diffraction Electron diffraction Neutron diffraction Particles diffraction In-situ optical analysis Photoluminescence and plasma-emission spectroscopy Raman and Infrared spectroscopy Composition '³ Electron Probe Microanalysis Auger spectroscopy X-ray Photoelectron Spectroscopy Secondary Ion Mass Spectrometry Rutherford Backscattering Spectrometry and Electron Recoil Detection Analysis Submicrometric lithography through Scanning Probe metho ds '³ STM, AFM, SNOM X-ray lithography |
Laboratories and/or exercises
Exercises and laboratories
a) Growth of thin films by Plasma Enhanced CVD techniques, etching through plasma processes, analysis trough microscopy and profilometry b) Analysis of bulk and thin film semiconductors by transmittance, photoluminescence, Raman and Infrared spectroscopy c) Surface analysis of bulk, thin film and nanostructured semiconductors by Atomic Force and Scanning Electron Microscopies; compositional insight trough Electron Microanalysis d) Metal growth, Optical lithography and wet-etching for the fabrication of micrometric patterning on Silicon substrates |
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