Politecnico di Torino
Politecnico di Torino
Politecnico di Torino
Academic Year 2009/10
Characterizations of technological processes
Master of science-level of the Bologna process in Nanotechnologies For Ict Engineering - Torino/Grenoble/Losanna
Master of science-level of the Bologna process in Electronic Engineering - Torino
Teacher Status SSD Les Ex Lab Tut Years teaching
Giorgis Fabrizio ORARIO RICEVIMENTO O2 FIS/03 3.2 0 0.8 0 5
SSD CFU Activities Area context
FIS/03 4 A - Di base Fisica e chimica
Objectives of the course
To provide basic knowledge of characterization techniques for the microelectronic industry and the micro and nano-technology research fields
Introduction to Materials Characterization: Composition, Stucture and Morphology through fundamental interactions (photons-matter, electrons-matter, ions/particles-matter)
Morphology ' optical microscopy (conventional, confocal and near-field optical microscopies)
Electronic microscopy (SEM and TEM)
Ionic microscopy (Focus Ion Beam)
Scanning probe microscopy (STM and AFM)
Structure ' X-ray scattering and diffraction
Electron diffraction
Neutron diffraction
Particles diffraction
In-situ optical analysis
Photoluminescence and plasma-emission spectroscopy
Raman and Infrared spectroscopy
Composition ' Electron Probe Microanalysis
Auger spectroscopy
X-ray Photoelectron Spectroscopy
Secondary Ion Mass Spectrometry
Rutherford Backscattering Spectrometry and Electron Recoil Detection Analysis
Submicrometric lithography through Scanning Probe metho ds ' STM, AFM, SNOM
X-ray lithography
Laboratories and/or exercises
Exercises and laboratories
a) Growth of thin films by Plasma Enhanced CVD techniques, etching through plasma processes, analysis trough microscopy and profilometry
b) Analysis of bulk and thin film semiconductors by transmittance, photoluminescence, Raman and Infrared spectroscopy
c) Surface analysis of bulk, thin film and nanostructured semiconductors by Atomic Force and Scanning Electron Microscopies; compositional insight trough Electron Microanalysis
d) Metal growth, Optical lithography and wet-etching for the fabrication of micrometric patterning on Silicon substrates

Programma definitivo per l'A.A.2009/10

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