| KEYWORD |
Laser Thermal Annealing of a CVD deposited thin film Silicon Carbide
Reference persons SERGIO FERRERO, LUCIANO SCALTRITO
Research Groups AA - Materials and Processes for Micro and Nano Technologies
Thesis type EXPERIMENTAL APPLIED
Description Silicon carbide (SiC) devices to date have shown significant advantages in power electronics due to their wide bandgap properties. There are evident applications in the optoelectronics sector but to date considerable studies are needed on some process steps, such as the deposition of thin layers with crystalline qualities optimized for optical applications.
Among these, a key process in the production flow is the heat treatment, after CVD deposition of amorphous layers, to achieve the recrystallization of the film.
The aim of this thesis is to study the annealing process using laser technology in order to obtain reliable process results for applications in optoelectronics.
Required skills Semiconductor Materials, Laser Processes
Deadline 16/03/2024
PROPONI LA TUA CANDIDATURA